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Selective laser crystallization of germanium in amorphous Ge/Si multilayer stacks
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SYSNO ASEP 0582161 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Selective laser crystallization of germanium in amorphous Ge/Si multilayer stacks Author(s) Volodin, V.A. (RU)
Cheng, Y. (RU)
Bulgakov, Alexander (FZU-D) ORCID
Levy, Yoann (FZU-D)
Beránek, Jiří (FZU-D)
Nagisetty, Siva S. (FZU-D)
Zukerstein, Martin (FZU-D) ORCID
Popov, A. A. (RU)
Bulgakova, Nadezhda M. (FZU-D) ORCIDNumber of authors 9 Article number STh1N.6 Source Title CLEO 2023 Technical Digest Series. - Washington : Optica Publishing Group, 2023 - ISBN 978-1-957171-25-8 Number of pages 2 s. Publication form Online - E Action CLEO: Science and Innovations 2023 Event date 07.05.2023 - 12.05.2023 VEvent location San Jose Country US - United States Event type WRD Language eng - English Country US - United States Keywords laser crystallization ; silicon-germanium multilayers ; infrared ultrashort lasers ; Raman spectroscopy Subject RIV BH - Optics, Masers, Lasers OECD category Optics (including laser optics and quantum optics) Institutional support FZU-D - RVO:68378271 DOI 10.1364/CLEO_SI.2023.STh1N.6 Annotation Selective laser crystallization of germanium in multilayer stacks consisting of alternating amorphous nanosized films of silicon and germanium deposited on silicon and glass substrates has been achieved using near- and mid-infrared ultrashort laser pulses. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2024 Electronic address https://opg.optica.org/abstract.cfm?uri=CLEO_SI-2023-STh1N.6
Number of the records: 1