Number of the records: 1  

Intensity distribution modulation of multiple beam interference pattern

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    SYSNO ASEP0567486
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleIntensity distribution modulation of multiple beam interference pattern
    Author(s) Jochcová, Dominika (FZU-D) ORCID
    Kaufman, Jan (FZU-D) ORCID
    Hauschwitz, Petr (FZU-D) ORCID
    Brajer, Jan (FZU-D) ORCID
    Vanda, Jan (FZU-D) RID, ORCID
    Number of authors5
    Source TitleMM Science Journal. - : MM publishing - ISSN 1803-1269
    Roč. 2019, Dec (2019), s. 3652-3656
    Number of pages5 s.
    Languageeng - English
    CountryCZ - Czech Republic
    Keywordsdirect Laser interference patterning ; multiple beam interference ; interference field simulation ; diffractive optical element ; laser microstructuring
    Subject RIVBH - Optics, Masers, Lasers
    OECD categoryOptics (including laser optics and quantum optics)
    R&D ProjectsLM2015086 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LO1602 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingOpen access
    Institutional supportFZU-D - RVO:68378271
    UT WOS000532572200043
    EID SCOPUS85076599510
    DOI10.17973/MMSJ.2019_12_2019117
    AnnotationNanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography,are considerably slow.In order to reduce processing time,laser patterning methods based on interference of multiple beams have been developed.Within one laser pulse,a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures.Interference patterning goes beyond periodic lines and dots.Controlling the number of interfering beams,orientation of polarization vectors,relative phase shift,the beam angle of incidence allows to customize the intensity distribution on the sample surface.Simulations of various interference patterns were verified on CMOS camera using 1030nm laser diode.Based on these results,dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8ps,11mJ las. pulses at 1030nm.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2023
    Electronic addresshttps://hdl.handle.net/11104/0338735
Number of the records: 1  

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