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Bi Layer properties in the Bi-FeNi GMR-type structures probed by spectroscopic ellipsometry
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SYSNO ASEP 0562430 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Bi Layer properties in the Bi-FeNi GMR-type structures probed by spectroscopic ellipsometry Author(s) Kovaleva, N. (RU)
Chvostová, Dagmar (FZU-D) RID, SAI, ORCID
Fekete, Ladislav (FZU-D) RID, ORCID
Dejneka, Alexandr (FZU-D) RID, ORCIDNumber of authors 4 Article number 872 Source Title Coatings. - : MDPI
Roč. 12, č. 6 (2022)Number of pages 13 s. Language eng - English Country CH - Switzerland Keywords optical GMR effect ; bismuth-permalloy multilayers ; spectroscopic ellipsometry Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Open access Institutional support FZU-D - RVO:68378271 UT WOS 000817703700001 EID SCOPUS 85132901474 DOI 10.3390/coatings12060872 Annotation Bismuth (Bi) having a large atomic number is characterized by a strong spin–orbit coupling (SOC) and is a parent compound of many 3D topological insulators (TIs). The ultrathin Bi films are supposed to be 2D TIs possessing a nontrivial topology, which opens the possibility of developing new efficient technologies in the field of spintronics. Here we aimed at studying the dielectric function properties of ultrathin Bi/FeNi periodic structures using spectroscopic ellipsometry. The [Bi(d)–FeNi(1.8 nm)]N GMR-type structures were grown by rf sputtering deposition on Sitall-glass (TiO2) substrates. The llipsometric angles Y(w) and D(w) were measured for the grown series (d = 0.6, 1.4, 2.0, and 2.5 nm, N= 16) of the multilayered film samples at room temperature for four angles of incidence of 60, 65, 70, and 75 in a wide photon energy range of 0.5–6.5 eV. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2023 Electronic address https://hdl.handle.net/11104/0334749
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