Thermal stability of black aluminum films and growth of aluminum nanowires from mechanical defects on the film surface during annealing

0552119 - FZÚ 2023 RIV DE eng J - Journal Article
Romanova, M. - More Chevalier, Joris - Novotný, Michal - Pokorný, Petr - Volfová, Lenka - Fitl, P. - Poplausks, R. - Dekhtyar, Y.
Thermal stability of black aluminum films and growth of aluminum nanowires from mechanical defects on the film surface during annealing.
Physica Status Solidi B. Roč. 259, č. 8 (2022), č. článku 2100467. ISSN 0370-1972. E-ISSN 1521-3951
Grant - others:AV ČR(CZ) LZA-19-01
Program: Bilaterální spolupráce
Institutional support: RVO:68378271
Keywords : aluminum nanowires * black aluminum * black metal * exoelectron emission * 2 recrystallization * stress-induced migration * thermal stability
OECD category: Coating and films
Impact factor: 1.6, year: 2022
Method of publishing: Limited access
https://doi.org/10.1002/pssb.202100467

The thermal stability of black aluminum (Black Al) films deposited on unheated fused silica substrates by pulsed DC magnetron sputtering is investigated. The deposited films have porous moth-eye morphology and a relatively soft surface that can be easily damaged mechanically. Photothermally stimulated exoelectron emission (PTSE) spectra of the films have emission peaks at 180 and 300 C, which can be associated with processes of aluminum recrystallization occurring at these temperatures. The total emitted charge of PTSE decreases according to a power law with each subsequent heating, indicating that the most pronounced structural changes on the film surface occur during its first annealing. The shape of the mechanically intact pores of the films does not change after heating.
Permanent Link: https://hdl.handle.net/11104/0334156