Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

Number of the records: 1

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SYSNO	0449004
Title	Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber
Author(s)	Pokorný, Petr (FZU-D)_{RID, ORCID, SAI} Musil, Jindřich (FZU-D)_{RID, ORCID} Fitl, Přemysl (FZU-D)_{RID, ORCID} Novotný, Michal (FZU-D)_{RID, ORCID, SAI} Lančok, Ján (FZU-D)_{RID, ORCID} Bulíř, Jiří (FZU-D)_{RID, ORCID, SAI}
Source Title	Plasma Processes and Polymers. Roč. 12, č. 5 (2015), s. 416-421. - : Wiley
Document Type	Článek v odborném periodiku
Grant	GAP108/11/1298 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
	GAP108/11/1312 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
	GAP108/11/0958 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
	GA14-10279S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	DE
Keywords	contamination * low-pressure discharges * magnetron * metallic films * sputtering
Permanent Link	http://hdl.handle.net/11104/0250593

Number of the records: 1