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Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films
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SYSNO ASEP 0439961 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films Author(s) Olejníček, Jiří (FZU-D) RID, ORCID
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Kohout, Michal (FZU-D) RID, ORCID
Kšírová, Petra (FZU-D) RID, ORCID
Brunclíková, Michaela (FZU-D) RID
Kment, Štěpán (FZU-D) RID, ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Darveau, S.A. (US)
Exstrom, C.L. (US)Source Title IEEE Photovoltaic Specialist Conference (PVSC 2014) /40./. - New York : IEEE, 2014 - ISBN 9781479943982 Pages s. 1666-1669 Number of pages 4 s. Publication form Online - E Action IEEE Photovoltaic Specialist Conference (PVSC 2014) /40./ Event date 08.06.2014-13.06.2014 VEvent location Denver Country US - United States Event type WRD Language eng - English Country US - United States Keywords CIGS ; HiPIMS ; emission spectroscopy ; magnetron sputtering ; thin films Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects LH12045 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 EID SCOPUS 84912103164 DOI 10.1109/PVSC.2014.6925239 Annotation CuIn1-xGaxSe2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic precursors. Thin film characteristics were measured using X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, energy-dispersive X-ray spectroscopy (EDX) and other techniques. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2015
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