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Measuring the ion flux to the deposition substrate in the hollow Cathode plasma jet

  1. 1.
    SYSNO ASEP0308119
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleMeasuring the ion flux to the deposition substrate in the hollow Cathode plasma jet
    TitleMěření iontového toku na depoziční substrát u plazmové trysky s efektem duté katody
    Author(s) Virostko, Petr (FZU-D)
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Adámek, Petr (FZU-D) RID, ORCID
    Kment, Štěpán (FZU-D) RID, ORCID
    Tichý, M. (CZ)
    Jastrabík, Lubomír (FZU-D) RID, ORCID
    Source TitlePlasma 2007. - Melville, New York : American Instritute of Physics, 2008 / Hartfuss H.-J. ; Dudeck M. ; Muslelok J. ; Sadowski M.J. - ISBN 978-0-7354-0512-7
    Pagess. 427-430
    Number of pages4 s.
    ActionInternational Conference on Research and Applications of Plasmas, German-Polish Conference on Plasma Diagnostics for Fusion and Laboratory /4./ and French-Polish Seminar on Thermal Plasma in Space and Laboratory /6./
    Event date16.10.2007-19.10.2007
    VEvent locationGreifswald
    CountryDE - Germany
    Event typeWRD
    Languageeng - English
    CountryUS - United States
    Keywordshollow cathode ; plasma jet ; ion flux ; deposition of thin films
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsKAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GA202/06/0776 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000254902600091
    AnnotationMeasurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2008
Number of the records: 1  

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