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Plasma jet sputtering as a perspective tool for preparation of Co-Cu-Mn oxides: effect of preparation conditions on properties and oxidation activity
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SYSNO ASEP 0575113 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Plasma jet sputtering as a perspective tool for preparation of Co-Cu-Mn oxides: effect of preparation conditions on properties and oxidation activity Author(s) Jirátová, Květa (UCHP-M) RID, ORCID, SAI
Čada, Martin (FZU-D) RID, ORCID, SAI
Perekrestov, Roman (FZU-D)
Balabánová, Jana (UCHP-M) RID, ORCID, SAI
Koštejn, Martin (UCHP-M) RID, SAI, ORCID
Maixner, J. (CZ)
Topka, Pavel (UCHP-M) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Kovanda, F. (CZ)Source Title Book of Abstracts. - Prague : Academic and Medical Conference Agency, 2023
S. 884Number of pages 1 s. Publication form Online - E Action EuropaCat /15./ Event date 27.08.2023 - 01.09.2023 VEvent location Prague Country CZ - Czech Republic Event type EUR Language eng - English Country CZ - Czech Republic Keywords plasma sputtering ; metal oxides ; oxidation of ethanol Subject RIV CI - Industrial Chemistry, Chemical Engineering OECD category Chemical process engineering Subject RIV - cooperation Institute of Physics - Plasma and Gas Discharge Physics R&D Projects GA21-04477S GA ČR - Czech Science Foundation (CSF) Institutional support UCHP-M - RVO:67985858 ; FZU-D - RVO:68378271 Annotation The alternative deposition method based on sputtering of metal nozzle (hollow cathode) with a flowing gas has attracted much attention. Inside the nozzle, a very intense discharge is ignited and the working gas (usually argon) flowing into a vacuum chamber forms the so-called plasma jet We decided to study a Co-Cu-Mn oxide system from the point of view of various conditions of plasma jet sputtering on stainless steel meshes and reveal their influence on the properties and activity in the total oxidation of ethanol as a model compound of VOCs. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2024
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