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Chemical vapor deposition of germanium-rich CrGe x nanowires
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SYSNO ASEP 0549904 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Chemical vapor deposition of germanium-rich CrGe x nanowires Author(s) Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Tiagulskyi, Stanislav (URE-Y)
Yatskiv, Roman (URE-Y) RID, ORCID
Grym, Jan (URE-Y)
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Jandová, Věra (UCHP-M) RID, ORCID, SAI
Koštejn, Martin (UCHP-M) RID, SAI, ORCID
Kupčík, Jaroslav (UCHP-M) RID, ORCID, SAISource Title Beilstein Journal of Nanotechnology. - : Beilstein - Institut zur Foerderung der Chemischen Wissenschaften - ISSN 2190-4286
Roč. 12, DEC 7 (2021), s. 1365-1371Number of pages 7 s. Language eng - English Country DE - Germany Keywords chemical vapor deposition ; chromium germanide ; nanostructured materials Subject RIV CF - Physical ; Theoretical Chemistry OECD category Physical chemistry Subject RIV - cooperation Institute of Radio Engineering and Electronics - Physical ; Theoretical Chemistry Method of publishing Open access Institutional support UCHP-M - RVO:67985858 ; URE-Y - RVO:67985882 UT WOS 000729366200001 EID SCOPUS 85122257273 DOI 10.3762/bjnano.12.100 Annotation Chemical vapor deposition was applied to synthetize nanostructured deposits containing several sorts of nanoobjects (i.e., nanoballs, irregular particles, and nanowires). Analytical techniques, that is, high-resolution transmission electron microscopy, scanning electron microscopy, electron dispersive X-ray analysis, selected area electron diffraction, and X-ray photoelectron spectroscopy, showed that unlike nanoballs and particles composed of crystalline germanium, the layer was made of chromium germanide CrGex. The nanowires possessed a complex structure, namely a thin crystalline germanium core and amorphous CrGex coating. The composition of the nanowire coating was [Cr]/[Ge] = 1:(6–7). The resistance of the nanowire–deposit system was estimated to be 2.7 kΩ·cm using an unique vacuum contacting system. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2022 Electronic address https://www.beilstein-journals.org/bjnano/content/pdf/2190-4286-12-100.pdf
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