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Study of electron scattering phenomena of advanced materials by UHV SLEEM/ToF
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SYSNO ASEP 0536979 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Study of electron scattering phenomena of advanced materials by UHV SLEEM/ToF Author(s) Konvalina, Ivo (UPT-D) RID, ORCID, SAI
Daniel, Benjamin (UPT-D) RID
Zouhar, Martin (UPT-D) ORCID, RID, SAI
Paták, Aleš (UPT-D) RID, ORCID, SAI
Piňos, Jakub (UPT-D) RID, ORCID, SAI
Radlička, Tomáš (UPT-D) RID, ORCID, SAI
Frank, Luděk (UPT-D) RID, SAI, ORCID
Müllerová, Ilona (UPT-D) RID, SAI, ORCID
Materna Mikmeková, Eliška (UPT-D) ORCID, RID, SAINumber of authors 9 Source Title Microscopy 2020. - Praha : Československá mikroskopická společnost, 2020
S. 95-96Number of pages 2 s. Publication form Print - P Action Microscopy 2020 Event date 06.10.2020 - 07.10.2020 VEvent location Lednice Country CZ - Czech Republic Event type EUR Language eng - English Country CZ - Czech Republic Keywords electron scattering phenomena Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering OECD category Electrical and electronic engineering R&D Projects TN01000008 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) Institutional support UPT-D - RVO:68081731 Annotation Two-dimensional (2D) materials have recently become very popular because of their interesting properties and rich application potential. Moreover, detailed knowledge of mechanisms of electron scattering and its practical consequences for very low energies is necessary in order to get a better understanding of contrast formation in the energy range below hundreds of eV. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2021
Number of the records: 1