Adjustable self-assembly in polystyrene-block-poly(4-vinylpyridine) dip-coated thin films

Konefal, Magdalena; Zhigunov, Alexander; Pavlova, Ewa; Černoch, Peter; Pop-Georgievski, Ognen; Špírková, Milena

doi:https://dx.doi.org/10.1016/j.polymer.2019.05.057

Number of the records: 1

Adjustable self-assembly in polystyrene-block-poly(4-vinylpyridine) dip-coated thin films

1.

SYSNO ASEP	0505444
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Adjustable self-assembly in polystyrene-block-poly(4-vinylpyridine) dip-coated thin films
Author(s)	Konefal, Magdalena (UMCH-V)_{ORCID, RID} Zhigunov, Alexander (UMCH-V)_{RID, ORCID} Pavlova, Ewa (UMCH-V)_RID Černoch, Peter (UMCH-V)_{RID, ORCID} Pop-Georgievski, Ognen (UMCH-V)_{RID, ORCID} Špírková, Milena (UMCH-V)_{RID, ORCID}
Source Title	Polymer. - : Elsevier - ISSN 0032-3861 Roč. 177, 26 August (2019), s. 35-42
Number of pages	8 s.
Language	eng - English
Country	GB - United Kingdom
Keywords	PS-b-P4VP ; self-assembly ; block copolymer
Subject RIV	CD - Macromolecular Chemistry
OECD category	Polymer science
R&D Projects	GA19-10982S GA ČR - Czech Science Foundation (CSF)
Method of publishing	Limited access
Institutional support	UMCH-V - RVO:61389013
UT WOS	000483429700005
EID SCOPUS	85067076070
DOI	10.1016/j.polymer.2019.05.057
Annotation	This work studies the influence of dip-coating parameters on self-assembly in ultra-thin films of asymmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymers from a 1-chloropentane solution using a combination of several experimental techniques. Small-Angle X-ray Scattering, Atomic Force Microscopy, Grazing Incidence Small Angle X-ray Scattering and Transmission Electron Microscopy were used to characterize the fabricated films. We have shown a facile fabrication route to smooth films with a wide range of thicknesses. Arranged domains of P4VP oriented perpendicularly to the substrate were observed. The domain sizes and spacing varied in the range from 13 up to 35 nm and from 39 to 115 nm, respectively.
Workplace	Institute of Macromolecular Chemistry
Contact	Eva Čechová, cechova@imc.cas.cz ; Tel.: 296 809 358
Year of Publishing	2020
Electronic address	https://www.sciencedirect.com/science/article/pii/S0032386119304823?via%3Dihub

Number of the records: 1