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Lift-off technology for thick metallic microstructures
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SYSNO 0485656 Title Lift-off technology for thick metallic microstructures Author(s) Krátký, Stanislav (UPT-D) RID, ORCID, SAI
Horáček, Miroslav (UPT-D) RID, ORCID, SAI
Meluzín, Petr (UPT-D) RID, ORCID, SAI
Kolařík, Vladimír (UPT-D) RID, ORCID, SAI
Matějka, Milan (UPT-D) RID, ORCID, SAI
Oulehla, Jindřich (UPT-D) RID, ORCID, SAI
Pesic, Z. (GB)Source Title METAL 2017. 26th International Conference on Metallurgy and Materials. Conference Proceedings. S. 1298-1302. - Ostrava : TANGER, 2017 Conference METAL 2017: International Conference on Metallurgy and Materials /26./, 24.05.2017, Brno - 26.05.2017 Document Type Konferenční příspěvek (zahraniční konf.) Grant TE01020233 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UPT-D - RVO:68081731 Language eng Country CZ Keywords lift-off technique * SU-8 photoresist * e-beam lithography * thick layer evaporation Permanent Link http://hdl.handle.net/11104/0280633
Number of the records: 1