Number of the records: 1  

Chemical processes induced by nanosecond discharge plasma in liquid hexane (ISPC23).

  1. SYS0483987
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    $a 20180104d m y slo 03 ba
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    $a eng
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    $a CA
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    $a Chemical processes induced by nanosecond discharge plasma in liquid hexane (ISPC23).
    210
      
    $d 2017
    300
      
    $a UT WOS / EID Scopus není, 20180716
    610
      
    $a Nanosecond discharge
    610
      
    $a organic liquids
    610
      
    $a plasmachemical synthesis
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    $3 cav_un_auth*0101396 $i Impulsní plazmové systémy $j Pulse Plasma Systems $k IPS $l PPS $w Pulse Plasma Systems $4 070 $a Lukeš $b Petr $p UFP-V $y CZ $T Ústav fyziky plazmatu AV ČR, v. v. i.
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    $3 cav_un_auth*0101363 $i Impulsní plazmové systémy $j Pulse Plasma Systems $k IPS $l PPS $w Pulse Plasma Systems $4 070 $a Člupek $b Martin $p UFP-V $y CZ $T Ústav fyziky plazmatu AV ČR, v. v. i.
    701
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    $3 cav_un_auth*0101352 $i Impulsní plazmové systémy $j Pulse Plasma Systems $k IPS $l PPS $w Pulse Plasma Systems $4 070 $a Babický $b Václav $p UFP-V $y CZ $T Ústav fyziky plazmatu AV ČR, v. v. i.
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    $3 cav_un_auth*0016359 $4 070 $a Chudoba $b J. $y CZ
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    $3 cav_un_auth*0252204 $4 070 $a Šimáček $b P. $y CZ
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    $3 cav_un_auth*0017367 $4 070 $a Janda $b V. $y CZ
Number of the records: 1  

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