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Multi-SWD plasma jet system for PECVD deposition of thin films

  1. 1.
    SYSNO0438735
    TitleMulti-SWD plasma jet system for PECVD deposition of thin films
    Author(s) Olejníček, Jiří (FZU-D) RID, ORCID
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Šmíd, Jiří (FZU-D)
    Kment, Štěpán (FZU-D) RID, ORCID
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Source Title IEEE Transactions on Plasma Science. Roč. 42, č. 10 (2014), s. 2502-2503. - : Institute of Electrical and Electronics Engineers
    Document TypeČlánek v odborném periodiku
    Grant TA01011740 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
    LH12045 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    M100101215, CZ - Czech Republic
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryUS
    Keywords nuclear and plasma sciences * plasma applications * plasma devices * plasmas
    Permanent Linkhttp://hdl.handle.net/11104/0242111
     
Number of the records: 1  

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