Number of the records: 1  

Nanodiamond

  1. 1.
    SYSNO ASEP0432021
    Document TypeM - Monograph Chapter
    R&D Document TypeMonograph Chapter
    TitleLow temperature diamond growth
    Author(s) Ižák, Tibor (FZU-D) RID
    Babchenko, Oleg (FZU-D) RID, ORCID
    Potocký, Štěpán (FZU-D) RID, ORCID
    Remeš, Zdeněk (FZU-D) RID, ORCID
    Kozak, Halyna (FZU-D) RID, ORCID
    Verveniotis, Elisseos (FZU-D) RID
    Rezek, Bohuslav (FZU-D) RID, ORCID
    Kromka, Alexander (FZU-D) RID, ORCID, SAI
    Source TitleNanodiamond. - Cambridge : The Royal Society of Chemistry, 2014 / Williams O.A. - ISBN 978-1-84973-639-8
    Pagess. 290-342
    Number of pages53 s.
    Number of pages530
    Publication formPrint - P
    Languageeng - English
    CountryGB - United Kingdom
    Keywordsdiamond film ; pulsed linear antenna MWCVD ; low temperature deposition ; temperature sensitive substrates
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGBP108/12/G108 GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    DOI10.1039/9781849737616-00290
    AnnotationThe present chapter focuses on the low temperature diamond growth from technological and practical point of view. The LTDG process is divided in two strategies based i) on the modification of the deposition systems and ii) on the change of gas chemistry. State of the art of each strategy and involved fundamental growth processes are reviewed. Among the discussed diamond growth processes, microwave surface wave plasma in linear antenna configuration with oxygen containing gas mixture is shown as the most promising process for the LTDG over large areas with high optical and electronic grade material. The growth phenomena observed in the linear antenna microwave plasma provide a simple way to control nano- and poly-crystalline diamond character. A practical comparison between focused and linear antenna microwave plasma is presented on several key studies which utilize the LTDG on amorphous silicon, glass, germanium and optical elements used for IR spectroscopy.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2015
Number of the records: 1  

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