Number of the records: 1  

Nanoparticles in hydrogenated silicon

  1. 1.
    SYSNO ASEP0391268
    Document TypeA - Abstract
    R&D Document TypeThe record was not marked in the RIV
    R&D Document TypeNení vybrán druh dokumentu
    TitleNanoparticles in hydrogenated silicon
    Author(s) Stuchlík, Jiří (FZU-D) RID, ORCID
    Stuchlíková, The-Ha (FZU-D) RID, ORCID
    Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
    Remeš, Zdeněk (FZU-D) RID, ORCID
    Kočka, Jan (FZU-D) RID, ORCID, SAI
    Source TitleDevelopment of Materials Science in Research and Education, Book of Abstracts of the 22nd Joint Seminar. - Praha : Czechoslovak Association for Crystal Growth (CSACG), 2012 / Kožíšek Z. ; Nitsch K. - ISBN 978-80-260-2357-9
    S. 65-65
    Number of pages1 s.
    ActionJoint Seminar – Development of materials science in research and education /22./
    Event date03.09.2012-07.09.2012
    VEvent locationLednice
    CountryCZ - Czech Republic
    Event typeEUR
    Languageeng - English
    CountryCZ - Czech Republic
    Keywordssilicon thin films ; solar cells
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGA203/09/1088 GA ČR - Czech Science Foundation (CSF)
    LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LH12236 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportUCHP-M - RVO:67985858
    CEZAV0Z10100521 - FZU-D (2005-2011)
    AnnotationWe developed the radio frequency plasma enhanced chemical vapor deposition (RF PE CVD) of hydrogenated silicon thin film in glow discharge of Silane diluted in Hydrogen. In the last years we have started to investigate the properties of nanoparticles embedded in the silicon matrix. We have observed that some nanoparticles can indeed be embedded in the silicon to create the quantum dots, whereas others lead to catalytic growth of silicon nanowires (Si-NW).
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2014
Number of the records: 1  

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