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Enhanced growth rate of diamond films at low temperature in focused microwave plasma system
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SYSNO ASEP 0570793 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Enhanced growth rate of diamond films at low temperature in focused microwave plasma system Author(s) Babčenko, Oleg (FZU-D) ORCID
Bydžovská, Irena (FZU-D) ORCID
Fait, Jan (FZU-D) ORCID
Shagieva, Ekaterina (FZU-D) ORCID
Ondič, Lukáš (FZU-D) RID, ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAINumber of authors 6 Source Title NANOCON 2022 Conference Proceedings. - Ostrava : Tanger Ltd., 2023 - ISSN 2694-930X - ISBN 978-80-88365-09-9 Pages s. 77-83 Number of pages 7 s. Publication form Print - P Action 14th International Conference on Nanomaterials - Research & Application - NANOCON 2022 Event date 19.10.2022 - 21.10.2022 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords well-faceted diamonds ; low temperature deposition ; high growth rate ; low non-diamond content ; focused plasma Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Nano-materials (production and properties) R&D Projects LUASK22147 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Research Infrastructure CzechNanoLab - 90110 - Vysoké učení technické v Brně Institutional support FZU-D - RVO:68378271 EID SCOPUS 85151370212 DOI 10.37904/nanocon.2022.4587 Annotation The low temperature (< 500 °C) diamond film deposition on fused silica in two different focused microwave plasma systems, i.e. a multimode clamshell cavity (MCC) and a rotational ellipsoid cavity (REC) reactor, was investigated. During the experiments, the methane to hydrogen ratio, in the hydrogen-rich process gas mixture, varied from 1 % to 15 % for MCC and from 1 % to 9 % for REC. The grown films were analyzed by scanning electron microscopy and Raman shift measurements. The outcomes of the study and enhanced diamond growth at low temperatures is advantageous for overcoating of fused silica as well as thermally sensitive substrates, e.g. optical elements, photonic crystals, sensors, etc. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2024 Electronic address https://www.confer.cz/nanocon/2022/4587-enhanced-growth-rate-of-diamond-films-at-low-temperature-in-focused-microwave-plasma-system
Number of the records: 1