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A sampler of diffraction and refraction optically variable image elements
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SYSNO ASEP 0564672 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title A sampler of diffraction and refraction optically variable image elements Author(s) Horáček, Miroslav (UPT-D) RID, ORCID, SAI
Krátký, Stanislav (UPT-D) RID, ORCID, SAI
Matějka, Milan (UPT-D) RID, ORCID, SAI
Chlumská, Jana (UPT-D) RID, ORCID, SAI
Meluzín, Petr (UPT-D) RID, ORCID, SAI
Pirunčík, J. (CZ)
Aubrecht, I. (CZ)
Kotrlý, M. (CZ)
Kolařík, Vladimír (UPT-D) RID, ORCID, SAINumber of authors 9 Source Title NANOCON 2021 - Conference proceedings. - Ostrava : Tanger Ltd., 2021 - ISSN 2694-930X - ISBN 978-80-88365-00-6 Pages s. 436-441 Number of pages 6 s. Publication form Online - E Action International Conference on Nanomaterials - Research & Application /13./ NANOCON Event date 20.10.2021 - 22.10.2021 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords diffraction ; refraction ; e-beam writer ; embossing ; galvanic replication ; mastering ; optically variable image element ; security ; valuables Subject RIV BH - Optics, Masers, Lasers OECD category Nano-processes (applications on nano-scale) R&D Projects VI20192022147 GA MV - Ministry of Interior (MV) Institutional support UPT-D - RVO:68081731 EID SCOPUS 85127268596 DOI 10.37904/nanocon.2021.4371 Annotation Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2023 Electronic address https://www.confer.cz/nanocon/2021/4371-a-sampler-of-diffraction-and-refraction-optically-variable-image-elements
Number of the records: 1