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Deposition of chiral heptahelicene molecules on ferromagnetic Co and Fe thin-film substrates

  1. 1.
    SYSNO ASEP0561708
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleDeposition of chiral heptahelicene molecules on ferromagnetic Co and Fe thin-film substrates
    Author(s) Safari, M.R. (DE)
    Matthes, F. (DE)
    Ernst, Karl-Heinz (FZU-D) ORCID
    Bürgler, D.E. (DE)
    Schneider, C. M. (DE)
    Number of authors5
    Article number3281
    Source TitleNanomaterials. - : MDPI
    Roč. 12, č. 19 (2022)
    Number of pages18 s.
    Languageeng - English
    CountryCH - Switzerland
    Keywordschiral molecules ; molecular deposition ; ferromagnetic surfaces ; adsorption geometry ; STM
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    Method of publishingOpen access
    Institutional supportFZU-D - RVO:68378271
    UT WOS000867959100001
    EID SCOPUS85139774828
    DOI10.3390/nano12193281
    AnnotationThe discovery of chirality-induced spin selectivity (CISS), resulting from an interaction between the electron spin and handedness of chiral molecules, has sparked interest in surface-adsorbed chiral molecules due to potential applications in spintronics, enantioseparation, and enantioselective chemical or biological processes. We study the deposition of chiral heptahelicene by sublimation under ultra-high vacuum onto bare Cu(111), Co bilayer nanoislands on Cu(111), and Fe bilayers on W(110) by low-temperature spin-polarized scanning tunneling microscopy/spectroscopy (STM/STS). In all cases, the molecules remain intact and adsorb with the proximal phenanthrene group aligned parallel to the surface. Three degenerate in-plane orientations on Cu(111) and Co(111), reflecting substrate symmetry, and only two on Fe(110), i.e., fewer than symmetry permits, indicate a specific adsorption site for each substrate.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2023
    Electronic addresshttps://hdl.handle.net/11104/0334224
Number of the records: 1  

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