Number of the records: 1  

The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)

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    SYSNO ASEP0549949
    Document TypeA - Abstract
    R&D Document TypeO - Ostatní
    TitleThe changes induced on oriented ZnO surface by inductively coupled plasma (ICP)
    Author(s) Remeš, Zdeněk (FZU-D) RID, ORCID
    Artemenko, Anna (FZU-D) RID, ORCID
    Ukraintsev, Egor (FZU-D) RID, ORCID
    Rezek, B. (CZ)
    Poruba, A. (CZ)
    Hsu, H.S. (TW)
    Mičová, J. (SK)
    Number of authors7
    Source TitleE-MRS Spring Meeting - Symposia & program Section N Current trends in optical and X-ray metrology of advanced materials for nanoscale devices VI. - Strasbourg : European Materials Research Society (E-MRS), 2021
    Number of pages1 s.
    Publication formOnline - E
    Action2021 Spring Meeting of the European Materials Research Society (E-MRS)
    Event date31.05.2021 - 03.06.2021
    VEvent locationVirtual
    CountryFR - France
    Event typeWRD
    Languageeng - English
    CountryFR - France
    KeywordsICP ; ZnO ; XPS ; AFM
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    R&D ProjectsEF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GC19-02858J GA ČR - Czech Science Foundation (CSF)
    LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportFZU-D - RVO:68378271
    AnnotationThe plasma treatment has been done in a novel inductively coupled plasma (ICP) quartz reactor recently developed in the cooperation with the Czech company SVCS Process Innovation s. r. o. in Valazske Mezirici. The reactor operates at the radio frequency 13.56 MHz with up to 300 W discharge power and H2, O2, N2 and Ar process gasses at low pressure about 20 Pa. X-ray photoelectron spectroscopy (XPS) showed contamination of plasma processed ZnO powder surface by silicon and fluorine from quartz walls and polytetrafluoroethylene (PFTE) sealing that disappeared after reducing a parasitic capacitive coupling between antenna and grounded stainless steel holder. We measure topography and surface potential of ZnO nanorods and monocrystalline ZnO samples after different plasma treatments by atomic force microscopy (AFM) and Kelvin probe force microscopy (KFPM). Preliminary results show similar morphology before and after plasma treatment, but different average surface potential values.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2022
Number of the records: 1  

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