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The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)
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SYSNO ASEP 0549949 Document Type A - Abstract R&D Document Type O - Ostatní Title The changes induced on oriented ZnO surface by inductively coupled plasma (ICP) Author(s) Remeš, Zdeněk (FZU-D) RID, ORCID
Artemenko, Anna (FZU-D) RID, ORCID
Ukraintsev, Egor (FZU-D) RID, ORCID
Rezek, B. (CZ)
Poruba, A. (CZ)
Hsu, H.S. (TW)
Mičová, J. (SK)Number of authors 7 Source Title E-MRS Spring Meeting - Symposia & program Section N Current trends in optical and X-ray metrology of advanced materials for nanoscale devices VI. - Strasbourg : European Materials Research Society (E-MRS), 2021 Number of pages 1 s. Publication form Online - E Action 2021 Spring Meeting of the European Materials Research Society (E-MRS) Event date 31.05.2021 - 03.06.2021 VEvent location Virtual Country FR - France Event type WRD Language eng - English Country FR - France Keywords ICP ; ZnO ; XPS ; AFM Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GC19-02858J GA ČR - Czech Science Foundation (CSF) LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 Annotation The plasma treatment has been done in a novel inductively coupled plasma (ICP) quartz reactor recently developed in the cooperation with the Czech company SVCS Process Innovation s. r. o. in Valazske Mezirici. The reactor operates at the radio frequency 13.56 MHz with up to 300 W discharge power and H2, O2, N2 and Ar process gasses at low pressure about 20 Pa. X-ray photoelectron spectroscopy (XPS) showed contamination of plasma processed ZnO powder surface by silicon and fluorine from quartz walls and polytetrafluoroethylene (PFTE) sealing that disappeared after reducing a parasitic capacitive coupling between antenna and grounded stainless steel holder. We measure topography and surface potential of ZnO nanorods and monocrystalline ZnO samples after different plasma treatments by atomic force microscopy (AFM) and Kelvin probe force microscopy (KFPM). Preliminary results show similar morphology before and after plasma treatment, but different average surface potential values. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2022
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