In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films

NOVOTNÝ, M., FITL, P., IRIMICIUC, S.A., BULÍŘ, J., MORE CHEVALIER, J., FEKETE, L., HRUŠKA, P., CHERTOPALOV, S., VRŇATA, M., LANČOK, J. In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films. Journal of Applied Physics. 2021, 130(8), 085301. ISSN 0021-8979. E-ISSN 1089-7550. Available: doi: 10.1063/5.0057317.