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Suppressed contamination of InGaN/GaN MQW region by growing the buffer layer at lower temperature
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SYSNO ASEP 0501495 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Suppressed contamination of InGaN/GaN MQW region by growing the buffer layer at lower temperature Author(s) Hospodková, Alice (FZU-D) RID, ORCID, SAI
Dominec, Filip (FZU-D) RID, ORCID
Hubáček, Tomáš (FZU-D) ORCID
Zíková, Markéta (FZU-D) RID
Pangrác, Jiří (FZU-D) RID, ORCID, SAI
Oswald, Jiří (FZU-D) RID, ORCID
Kuldová, Karla (FZU-D) RID, ORCID
Vetushka, Aliaksi (FZU-D) RID, ORCID
Hulicius, Eduard (FZU-D) RID, ORCID, SAINumber of authors 9 Source Title ICMOVPE XIX - Technical Digest. - Nara : Japanese Association for Crystal Growth, 2018 / Miyake H.
S. 147-147Number of pages 1 s. Publication form Online - E Action 19th International Conference on Metalorganic Vapor Phase Epitaxy - ICMOVPE XIX Event date 03.06.2018 - 08.06.2018 VEvent location Nara Country JP - Japan Event type WRD Language eng - English Country JP - Japan Keywords GaN buffer layer ; scintillators ; low dimensional structures ; V-pits ; metalorganic vapor phase epitaxy ; InGaN/GaN QWs Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects LO1603 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA16-15569S GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 Annotation Fast response of scintillators based on InGaN/GaN multiple quantum wells is compromised by slower luminescence defect band of unknown origin. SIMS analysis suggests that impurities concentrate in the quantum-well region, due to a drop in growth temperature. Using MOVPE we have prepared a set of samples with additional low-temperature buffer GaN layers to keep the impurities farther from the quantum wells. Our spectroscopic measurements have confirmed that this modification indeed results in enhancement of the fast luminescence component and reduction of the slow one. AFM images for two samples that differ mostly by morphology however points to another explanation, with formation of larger V-pits being the main reason for the luminescence improvement. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2019
Number of the records: 1