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Determination of temperature dependent parameters of zero-phonon line in photo-luminescence spectrum of silicon-vacancy centre in CVD diamond thin films
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SYSNO ASEP 0487173 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Determination of temperature dependent parameters of zero-phonon line in photo-luminescence spectrum of silicon-vacancy centre in CVD diamond thin films Author(s) Dragounová, Kateřina (FZU-D) ORCID
Potůček, Z. (CZ)
Potocký, Štěpán (FZU-D) RID, ORCID
Bryknar, Z. (CZ)
Kromka, Alexander (FZU-D) RID, ORCID, SAINumber of authors 5 Source Title Journal of Electrical Engineering - Elektrotechnický časopis. - : Slovenská technická univerzita v Bratislave - ISSN 1335-3632
Roč. 68, č. 1 (2017), s. 74-78Number of pages 5 s. Language eng - English Country SK - Slovakia Keywords silicon-vacancy centres ; photoluminescence ; low temperature ; diamond ; CVD Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects GA14-04790S GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 UT WOS 000396613900010 DOI 10.1515/jee-2017-0010 Annotation In this work we present a methodological approach to the temperature dependence of photoluminescence (PL) emission spectra of the silicon-vacancy centre in diamond thin films prepared by chemical vapour deposition. The PL spectra were measured in the temperature range of 11 300 K and used to determine the temperature dependence of the zero-phonon-line full-width at half-maximum and of the peak position. Experimental data were fitted by models of lattice contraction, quadratic electron-phonon coupling, homogeneous and inhomogeneous broadening. We found that the shift of peak position and peak broadening reflect polynomial dependence on temperature. Moreover, a proper setting of monochromator slits width is discussed with respect to line profile broadening. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2018
Number of the records: 1