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Low Temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) of TiN on Si Substrates

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    SYSNO0179279
    TitleLow Temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) of TiN on Si Substrates
    Author(s) Nohava, Jiří (UFP-V)
    Jedrzejowski, P. (PL)
    Source TitleWorkshop ČVUT 2001. s. 458-459. - Praha : ČVUT Praha, 2001
    Conference Workshop ČVUT 2001., Praha, 05.02.2001-07.02.2001
    Document TypeAbstrakt
    CEZAV0Z2043910 - UFP-V
    Languageeng
    CountryCZ
    Keywords PECVD, titanum nitride, low temperature
    Permanent Linkhttp://hdl.handle.net/11104/0076081
     

Number of the records: 1  

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