Number of the records: 1
Low Temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) of TiN on Si Substrates
- 1.Nohava, Jiří - Jedrzejowski, P.
Low Temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) of TiN on Si Substrates.
Workshop ČVUT 2001. Praha: ČVUT Praha, 2001. s. 458-459. ISBN 80-01-02335-4.
[Workshop ČVUT 2001. 05.02.2001-07.02.2001, Praha]
http://hdl.handle.net/11104/0076081
Number of the records: 1