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Low Temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) of TiN on Si Substrates
- 1.NOHAVA, J., JEDRZEJOWSKI, P. Low Temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) of TiN on Si Substrates. In: Workshop ČVUT 2001. Praha: ČVUT Praha, 2001, s. 458-459. ISBN 80-01-02335-4.
Number of the records: 1