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Megawatt Laser Photolysis of Trimethyl(vinyloxy)silane: Formation of Nano-sized Cross-linked Polyoxocarbosilane with Superior Thermal Stability
- 1.0166827 - UCHP-M 20030144 RIV NL eng J - Journal Article
Pola, Josef - Tomovska, R. - Bakardjieva, Snejana - Galíková, Anna - Vacek, Karel - Galík, Aftanas
Megawatt Laser Photolysis of Trimethyl(vinyloxy)silane: Formation of Nano-sized Cross-linked Polyoxocarbosilane with Superior Thermal Stability.
Journal of Non-Crystalline Solids. Roč. 328, 1-3 (2003), s. 227-236. ISSN 0022-3093. E-ISSN 1873-4812
R&D Projects: GA MŠMT OC 523.60
Institutional research plan: CEZ:AV0Z4032918; CEZ:AV0Z4072921
Keywords : polyoxocarbosilane * laser chemical vapour deposition * trimethyl(vinyloxy)silane
Subject RIV: CF - Physical ; Theoretical Chemistry
Impact factor: 1.563, year: 2003
Megawatt ArF laser induced photolysis of gaseous trimethyl(vinyloxy)silane (TMVSi) results in chemical vapour deposition of solid nano-sized polyoxocarbosilane that is deduced as formed via agglomerization of SiCHnO species (nú3). The laser fabricated polymer shows superior thermal stability, contains radical Si centers and is described as a crosslinked polymethyloxocarbosilane consisting of CnSiO4-n (n = 0-3) configurations.
Permanent Link: http://hdl.handle.net/11104/0063936
Number of the records: 1