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Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films
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SYSNO ASEP 0134425 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films Author(s) Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Adámek, P. (CZ)
Ptáček, Pavel (FZU-D)
Šíchová, Hana (FZU-D)
Šícha, Miloš (FZU-D)
Jastrabík, Lubomír (FZU-D) RID, ORCIDSource Title Surface and Coatings Technology. - : Elsevier - ISSN 0257-8972
174-175, - (2003), s. 627-631Number of pages 5 s. Language eng - English Country NL - Netherlands Keywords plasma jet ; ZnO thin films ; Langmuir probe Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GP202/02/P021 GA ČR - Czech Science Foundation (CSF) GA202/00/1592 GA ČR - Czech Science Foundation (CSF) LN00A015 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ME 441 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z1010914 - FZU-D Annotation RF and DC plasma jet sputtering systems were investigated as sources for deposition of ZnO thin films. Deposited zone films have a strong orientation of hexagonal crystallites with "c" axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150 o C during the deposition. Langmuir probe measurement performed at the substrate revealed two groups of electrons with different temperatures in the DC plasma jet. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2004
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