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XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films
- 1.Zemek, Josef - Jiříček, Petr
XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films.
Vacuum. Roč. 71, - (2003), s. 329-333. ISSN 0042-207X. E-ISSN 1879-2715
Impact factor: 0.612, year: 2003
http://hdl.handle.net/11104/0007640
Number of the records: 1