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Laser ablation for material processing
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SYSNO ASEP 0556901 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Laser ablation for material processing Author(s) Cutroneo, Mariapompea (UJF-V) ORCID, RID, SAI
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Macková, Anna (UJF-V) RID, ORCID, SAI
Malinský, Petr (UJF-V) RID, ORCID, SAI
Silipigni, L. (IT)
Slepička, P. (CZ)
Fajstavr, D. (CZ)
Torrisi, L. (IT)Number of authors 8 Source Title Radiation Effects and Defects in Solids. - : Taylor & Francis - ISSN 1042-0150
Roč. 177, 1-2 (2022), s. 71-84Number of pages 14 s. Publication form Print - P Language eng - English Country GB - United Kingdom Keywords Backward plasma acceleration ; forward plasma acceleration ; pulsed laser deposition ; laser ablation in medium OECD category Nuclear physics Research Infrastructure CANAM II - 90056 - Ústav jaderné fyziky AV ČR, v. v. i. Method of publishing Limited access Institutional support UJF-V - RVO:61389005 UT WOS 000771135200001 EID SCOPUS 85126783947 DOI 10.1080/10420150.2022.2049783 Annotation The laser ablation is an established material processing for many applications in nanotechnology, materials science and biomedicine. The laser ablation can be carried out in vacuum, in air and in liquid. Laser ablation mechanisms and their products depend on laser fluence, wavelength, pulse duration, ablation environment as well as target composition, density, thickness, roughness. This contribution is addressed to laser ablation of solid targets with the aim of hot plasma generation and thin film deposition on substrates located in appropriate positions in vacuum and in air. In the first section is presented an example of forward and backward plasma accelerations using the sub-nanosecond laser at the PALS laboratory (Czech Republic) for pulsed laser deposition processing. In the second section is reported the use of a nanosecond laser coupled to a post-accelerating compact system employed at the INFN in Catania (Italy) to ablate germanium solid targets in vacuum and to deposit thin films on SiO2/Si substrates to modify their native features. The last section is focused on the use of the nanosecond laser at the Tandetron laboratory (Czech Republic) employed for pulsed laser deposition and laser-induced backward transfer processing in vacuum and in air. Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2023 Electronic address https://doi.org/10.1080/10420150.2022.2049783
Number of the records: 1