Co.sub.3./sub.O.sub.4./sub. thin films prepared by hollow cathode discharge

Olejníček, Jiří; Šmíd, Jiří; Perekrestov, Roman; Kšírová, P.; Rathouský, Jiří; Kohout, Michal; Dvořáková, M.; Kment, Štěpán; Jurek, Karel; Čada, Martin; Hubička, Zdeněk

doi:https://dx.doi.org/10.1016/j.surfcoat.2019.03.010

Number of the records: 1

Co.sub.3./sub.O.sub.4./sub. thin films prepared by hollow cathode discharge

1.

SYSNO ASEP	0520354
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Co₃O₄ thin films prepared by hollow cathode discharge
Author(s)	Olejníček, Jiří (FZU-D)_{RID, ORCID} Šmíd, Jiří (FZU-D) Perekrestov, Roman (FZU-D) Kšírová, P. (CZ) Rathouský, Jiří (UFCH-W)_{RID, ORCID} Kohout, Michal (FZU-D)_{RID, ORCID} Dvořáková, M. (CZ) Kment, Štěpán (FZU-D)_{RID, ORCID} Jurek, Karel (FZU-D)_{RID, ORCID, SAI} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI}
Number of authors	11
Source Title	Surface and Coatings Technology. - : Elsevier - ISSN 0257-8972 Roč. 366, May (2019), s. 303-310
Number of pages	8 s.
Language	eng - English
Country	CH - Switzerland
Keywords	cobalt oxide ; Co₃O₄ ; hollow cathode discharge ; magnetron sputtering ; thin films
Subject RIV	BL - Plasma and Gas Discharge Physics
OECD category	Fluids and plasma physics (including surface physics)
Subject RIV - cooperation	J. Heyrovsky Institute of Physical Chemistry - Physical ; Theoretical Chemistry
R&D Projects	EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA17-08389S GA ČR - Czech Science Foundation (CSF)
	LO1409 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Method of publishing	Limited access
Institutional support	FZU-D - RVO:68378271 ; UFCH-W - RVO:61388955
UT WOS	000465366400035
EID SCOPUS	85063460840
DOI	10.1016/j.surfcoat.2019.03.010
Annotation	Semiconducting crystalline Co3O4 thin films were deposited on glass, stainless steel and Si substrates using three different PVD methods: (i) RF magnetron sputtering, (ii) high-power impulse magnetron sputtering (HiPIMS), and (iii) hollow cathode discharge (HCD). All layers were sputtered from pure cobalt target (or nozzle) in reactive atmosphere and post-annealed on air. Properties of deposited layers have been studied and discussed with respect to their potential applications. The surface morphology of the films was analyzed by SEM, their crystalline structure by XRD and Raman spectroscopy, chemical composition by EDS, electrical properties by Van der Pauw method and the specific surface area was measured by standard BET analysis. The layers prepared by the hollow cathode discharge compared to the magnetron-prepared films exhibited higher porosity, higher resistivity, higher activation energy, and higher deposition rate during the sputtering process.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2020
Electronic address	https://doi.org/10.1016/j.surfcoat.2019.03.010

Number of the records: 1