Number of the records: 1
The intrinsic submicron ZnO thin films prepared by reactive magnetron sputtering
- 1.
SYSNO ASEP 0478348 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title The intrinsic submicron ZnO thin films prepared by reactive magnetron sputtering Author(s) Remeš, Zdeněk (FZU-D) RID, ORCID
Stuchlík, Jiří (FZU-D) RID, ORCID
Purkrt, Adam (FZU-D) RID
Chang, Yu-Ying (FZU-D)
Jirásek, Vít (FZU-D) RID
Štenclová, Pavla (FZU-D) ORCID
Prajzler, V. (CZ)
Nekvindová, P. (CZ)Number of authors 8 Source Title NANOCON 2016 8th International Conference on Nanomaterials - Research & Application. Conference proceedings. - Ostrava : TANGER Ltd., 2017 - ISBN 978-80-87294-71-0 Pages s. 36-41 Number of pages 6 s. Publication form Print - P Action NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./ Event date 19.10.2016 - 21.10.2016 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords ZnO ; reactive magnetron sputtering ; plasma treatment ; photothermal deflection spectroscopy ; optical spectroscopy Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects GC16-10429J GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 UT WOS 000410656100005 EID SCOPUS 85017225136 Annotation The DC reactive magnetron sputtering of metallic target in oxide atmosphere is a simple method of depositing the intrinsic (undoped) nanocrystalline layers of metal oxides. We have optimized the deposition of the intrinsic ZnO thin films with submicron thickness 50-500 nm on fused silica glass substrates and investigated the localized defect states below the optical absorption edge down to 0.01 % using photothermal deflection spectroscopy from UV to IR. We have shown that the defect density, the optical absorptance and the related optical attenuation in planar waveguides can be significantly reduced by annealing in air at 400 °C. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2018
Number of the records: 1