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Parameter Optimization of Multi-Level Diffraction Gratings
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SYSNO ASEP 0464388 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Parameter Optimization of Multi-Level Diffraction Gratings Author(s) Matějka, Milan (UPT-D) RID, ORCID, SAI
Kolařík, Vladimír (UPT-D) RID, ORCID, SAI
Horáček, Miroslav (UPT-D) RID, ORCID, SAI
Král, Stanislav (UPT-D) RID, SAINumber of authors 4 Source Title NANOCON 2016. 8th International Conference on Nanomaterials - Research and Application. Conference Proceedings. - Ostrava : Tanger, 2017 - ISBN 978-80-87294-71-0 Pages s. 751-756 Number of pages 6 s. Publication form Print - P Action NANOCON 2016. International Conference on Nanomaterials - Research and Application /8./ Event date 19.10.2016 - 21.10.2016 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords e-beam pattern generator ; variable shaped beam ; grayscale lithography ; multi-level grating Subject RIV BH - Optics, Masers, Lasers OECD category Nano-processes (applications on nano-scale) R&D Projects FR-TI1/576 GA MPO - Ministry of Industry and Trade (MPO) TE01020233 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UPT-D - RVO:68081731 UT WOS 000410656100130 Annotation Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white masks for the optical lithography. Multi-level relief structures can be also prepared using EBL patterning. Their preparation is based on the image patterning with a gradient of exposure doses. Large-area multi-level structures can be effectively prepared using the electron beam pattern generator with a variable shaped beam. We present several writing strategies. Basically, the main writing strategy uses one stamp (i.e. one elementary exposure of the shaped electron beam) per one elementary area with the same exposure dose. This simple approach is fast and flexible, however it does not guarantee optimal results. The main problem is an imperfection of the stamps (size, shape, and homogeneity). Advanced algorithms are based on multiple
exposure of the same elementary area, the total local exposure dose is a sum of several different elementary exposures (stamps). Using these algorithms, a smoother surface of the structure can be achieved. On the other hand, the writing speed is considerably decreased. Tradeoff between the achieved parameters and the writing speed is discussed for selected set of writing strategy algorithms.Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2018
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