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Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers
- 1.0099989 - ÚFM 2008 RIV JP eng C - Conference Paper (international conference)
Zajíčková, L. - Kučerová, Z. - Franta, D. - Buršíková, V. - Buršík, Jiří - Sťahel, P. - Klapetek, P.
Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers.
[Plazmochemická depozice vrstev z hexametyldisiloxanu a oktametyltetrasiloxanu.]
18th International Symposium on Plasma Chemistry. Kyoto: Kyoto University, 2007, s. 459-459. ISBN 978-4-9903773-2-8.
[International Symposium on Plasma Chemistry /18./. Kyoto (JP), 26.08.2007-31.08.2007]
Institutional research plan: CEZ:AV0Z20410507
Keywords : PECVD * HMDSO * OMCTS
Subject RIV: BL - Plasma and Gas Discharge Physics
Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers.Siloxane polymers.
Plazmochemická depozice vrstev z hexametyldisiloxanu a oktametyltetrasiloxanu. Siloxanové polymery.
Permanent Link: http://hdl.handle.net/11104/0158429
Number of the records: 1