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Laser-induced electron dynamics and surface modification in ruthenium thin films
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SYSNO ASEP 0582474 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Laser-induced electron dynamics and surface modification in ruthenium thin films Author(s) Akhmetov, F. (NL)
Milov, I. (NL)
Semin, S. (NL)
Formisano, F. (NL)
Medvedev, Nikita (UFP-V) ORCID
Sturm, J.M. (NL)
Zhakhovsky, V.V. (RU)
Makhotkin, I.A. (NL)
Kimel, A. (NL)
Ackermann, M. (NL)Number of authors 10 Article number 112045 Source Title Vacuum. - : Elsevier - ISSN 0042-207X
Roč. 212, June (2023)Number of pages 12 s. Language eng - English Country GB - United Kingdom Keywords Femtosecond laser damage ; Fermi smearing ; Pump-probe thermoreflectance ; Ruthenium ; Thin films ; Two-temperature molecular dynamics Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) R&D Projects LM2018114 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LTT17015 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) EF16_013/0001552 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Open access Institutional support UFP-V - RVO:61389021 UT WOS 000981025200001 EID SCOPUS 85151528799 DOI 10.1016/j.vacuum.2023.112045 Annotation We performed the experimental and theoretical study of the heating and damaging of ruthenium thin films induced by femtosecond laser irradiation. We present the results of an optical pump-probe thermoreflectance experiment with rotating sample allowing to significantly reduce heat accumulation in irradiated spot. We show the evolution of surface morphology from growth of a heat-induced oxide layer at low and intermediate laser fluences to cracking and grooving at high fluences. Theoretical analysis of thermoreflectance in our pump-probe experiment allows us to relate behavior of hot electrons in ruthenium to the Fermi smearing mechanism. This conclusion invites more research on Fermi smearing of transition metals. The analysis of heating is performed with the two-temperature modeling and molecular dynamics simulation, results of which demonstrate that the calculated single-shot melting threshold is higher than experimental damage threshold. We suggest that the onset of Ru film damage is caused by the heat-induced stresses that lead to cracking of the Ru film. Such damage accumulates during repetitive exposure to light. Workplace Institute of Plasma Physics Contact Vladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975 Year of Publishing 2024 Electronic address https://www.sciencedirect.com/science/article/pii/S0042207X23002427?via%3Dihub
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