Number of the records: 1
Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis
- 1.
SYSNO ASEP 0567910 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Nanosphere lithography-based fabrication of spherical nanostructures and verification of their hexagonal symmetries by image analysis Author(s) Domonkos, M. (CZ)
Kromka, Alexander (FZU-D) RID, ORCID, SAINumber of authors 2 Article number 2642 Source Title Symmetry-Basel. - : MDPI
Roč. 14, č. 12 (2022)Number of pages 16 s. Language eng - English Country CH - Switzerland Keywords nanosphere lithography ; self-assembly ; hexagonal symmetry ; plasma etching ; image analysis ; defect detection Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering OECD category Nano-materials (production and properties) R&D Projects LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Open access Institutional support FZU-D - RVO:68378271 UT WOS 000903184900001 EID SCOPUS 85144876013 DOI 10.3390/sym14122642 Annotation This paper reviews technological challenges in NSL mask preparation, its modification, and quality control. Spin coating with various process parameters (substrate wettability, solution properties, spin coating operating parameters) are discussed to create a uniform monolayer from monodisperse polystyrene (PS) nanospheres with a diameter of 0.2–1.5 um. The prepared highly ordered nanopatterned arrays (from circular, triangular, pillar-shaped structures) are applicable in many different fields (plasmonics, photonics, sensorics, biomimetic surfaces, life science, etc.).
Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2023 Electronic address https://hdl.handle.net/11104/0339173
Number of the records: 1