High deposition rate films prepared by reactive HiPIMS

Number of the records: 1

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SYSNO	0567523
Title	High deposition rate films prepared by reactive HiPIMS
Author(s)	Mareš, P. (CZ) Dubau, M. (CZ) Polášek, J. (CZ) Mates, Tomáš (FZU-D)_{RID, ORCID} Kozák, T. (CZ) Vyskočil, J. (CZ)
Source Title	Vacuum. Roč. 191, Sep (2021). - : Elsevier
Article number	110329
Document Type	Článek v odborném periodiku
Grant	LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries
	EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
	FV30177 GA MPO - Ministry of Industry and Trade (MPO)
	StrategieAV21/6, CZ - Czech Republic
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	GB
Keywords	reactive magnetron sputtering * HiPIMS * Monte-carlo simulations * deposition rate * sputtering yield
URL	https://doi.org/10.1016/j.vacuum.2021.110329
Permanent Link	https://hdl.handle.net/11104/0338777

Number of the records: 1