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Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer

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    SYSNO ASEP0561882
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleHighly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer
    Author(s) Chylek, J. (CZ)
    Maniaková, P. (SK)
    Hlubina, P. (CZ)
    Sobota, Jaroslav (UPT-D) RID, ORCID, SAI
    Pudiš, D. (SK)
    Number of authors5
    Article number3090
    Source TitleNanomaterials. - : MDPI
    Roč. 12, č. 18 (2022)
    Number of pages13 s.
    Publication formOnline - E
    Languageeng - English
    CountryCH - Switzerland
    Keywordssurface plasmon resonance ; Kretschmann configuration ; silicon dioxide overlayer ; reflectance ; aqueous analyte sensing
    Subject RIVBH - Optics, Masers, Lasers
    OECD categoryOptics (including laser optics and quantum optics)
    Method of publishingOpen access
    Institutional supportUPT-D - RVO:68081731
    UT WOS000857073900001
    EID SCOPUS85138715666
    DOI10.3390/nano12183090
    AnnotationIn this paper, simple and highly sensitive plasmonic structures are analyzed theoretically and experimentally. A structure comprising a glass substrate with a gold layer, two adhesion layers of chromium, and a silicon dioxide overlayer is employed in liquid analyte sensing. The sensing properties of two structures with distinct protective layer thicknesses are derived based on a wavelength interrogation method. Spectral reflectance responses in the Kretschmann configuration with a coupling BK7 prism are presented, using the thicknesses of individual layers obtained by a method of spectral ellipsometry. In the measured spectral reflectance, a pronounced dip is resolved, which is strongly red-shifted as the refractive index (RI) of the analyte increases. Consequently, a sensitivity of 15,785 nm per RI unit (RIU) and a figure of merit (FOM) of 37.9 RIU-1 are reached for the silicon dioxide overlayer thickness of 147.5 nm. These results are in agreement with the theoretical ones, confirming that both the sensitivity and FOM can be enhanced using a thicker silicon dioxide overlayer. The designed structures prove to be advantageous as their durable design ensures the repeatability of measurement and extends their employment compared to regularly used structures for aqueous analyte sensing.
    WorkplaceInstitute of Scientific Instruments
    ContactMartina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
    Year of Publishing2023
    Electronic addresshttps://www.mdpi.com/2079-4991/12/18/3090
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