Number of the records: 1
Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer
- 1.Chylek, J. - Maniaková, P. - Hlubina, P. - Sobota, Jaroslav - Pudiš, D.
Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer.
Nanomaterials. Roč. 12, č. 18 (2022), č. článku 3090. E-ISSN 2079-4991
OECD category: Optics (including laser optics and quantum optics)
Impact factor: 5.3, year: 2022
Method of publishing: Open access
https://www.mdpi.com/2079-4991/12/18/3090
https://hdl.handle.net/11104/0335270
Number of the records: 1