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Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer
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$a 10.3390/nano12183090 $2 DOI 101 0-
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$a Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer 215 $a 13 s. $c E 463 -1
$1 001 cav_un_epca*0445648 $1 011 $e 2079-4991 $1 200 1 $a Nanomaterials $v Roč. 12, č. 18 (2022) $1 205 $a ONLINE $1 210 $c MDPI 608 $a Article 610 $a surface plasmon resonance 610 $a Kretschmann configuration 610 $a silicon dioxide overlayer 610 $a reflectance 610 $a aqueous analyte sensing 700 -1
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Number of the records: 1