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Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer
- 1.CHYLEK, J., MANIAKOVÁ, P., HLUBINA, P., SOBOTA, J., PUDIŠ, D. Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer. Nanomaterials. 2022, 12(18), 3090. E-ISSN 2079-4991. Available: doi: 10.3390/nano12183090.
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