Deposition of oxide nanostructures by nanosecond laser ablation of silicon in an oxygen-containing background gas

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SYSNO	0561204
Title	Deposition of oxide nanostructures by nanosecond laser ablation of silicon in an oxygen-containing background gas
Author(s)	Rodionov, A.A. (RU) Starinskiy, S.V. (RU) Shukhov, Y.G. (RU) Bulgakov, Alexander (FZU-D)_ORCID
Source Title	Thermophysics and Aeromechanics. Roč. 28, č. 4 (2021), s. 549-554
Document Type	Článek v odborném periodiku
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	RU
Keywords	pulsed laser deposition * thin films * non-stoichiometric silicon oxide * laser ablation in background gas
URL	https://doi.org/10.1134/S0869864321040089
Permanent Link	https://hdl.handle.net/11104/0333878

Number of the records: 1