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Growth of carbon allotropes in plasma CVD system
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SYSNO ASEP 0559036 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Growth of carbon allotropes in plasma CVD system Author(s) Kromka, Alexander (FZU-D) RID, ORCID, SAI
Babčenko, Oleg (FZU-D) ORCID
Izsák, Tibor (FZU-D) ORCID
Varga, Marián (FZU-D) RID, ORCID
Vanko, G. (SK)
Zehetner, J. (AT)
Potocký, Štěpán (FZU-D) RID, ORCIDNumber of authors 7 Source Title Proceedings of ADEPT - ADEPT 2022. - Žilina : University of Žilina, 2022 / Feiler M. ; Ziman M. ; Kováčová S. ; Kováč, jr. J. - ISBN 978-80-554-1884-1 Pages s. 17-20 Number of pages 5 s. Publication form Print - P Action 10th International Conference on Advances in Electronic and Photonic Technologies - ADEPT 2022 Event date 20.06.2022 - 24.06.2022 VEvent location Tatranská Lomnica Country SK - Slovakia Event type EUR Language eng - English Country SK - Slovakia Keywords diamond ; carbon allotropes ; carbon nanotubes ; dual plasma Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Materials engineering R&D Projects 8X20035 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LM2018110 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 Annotation Various carbon (nano-) forms, so-called allotropes, have become one of the most supporting activities in fundamental and applied research trends. Therefore, a universal deposition process capable of “adjusting” system parameters in one “deposition chamber” is highly demanding. Here, we present a low-pressure large area deposition system combining radiofrequency (RF) and microwave (MW) plasma in one chamber in different configurations, which offers a wide deposition window for the growth of sp2 carbon (carbon nanotubes, amorphous carbon), a mixture of sp2 and sp3 (diamond-like films) and pure sp3 carbon represented by diamond films. We will show that not only the type of plasma source (RF vs. MW) but also the gas mixture and plasma chemistry are crucial parameters for the controllable and reproducible growth of these allotropes at temperatures from 250 to 800 °C. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2023
Number of the records: 1