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Low-emittance copper-coating system using atomic-layer-deposited aluminum oxide

  1. 1.
    SYSNO0557634
    TitleLow-emittance copper-coating system using atomic-layer-deposited aluminum oxide
    Author(s) Nyman, L. (FI)
    Frolec, Jiří (UPT-D) RID, ORCID, SAI
    Pudas, M. (FI)
    Králík, Tomáš (UPT-D) RID, ORCID, SAI
    Musilová, Věra (UPT-D) RID, SAI, ORCID
    Kallio, E. (FI)
    Corespondence/seniorNyman, L. - Korespondující autor
    Source Title Thin Solid Films. Roč. 749, 1 May (2022). - : Elsevier
    Article number139179
    Document TypeČlánek v odborném periodiku
    Grant LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportUPT-D - RVO:68081731
    Languageeng
    CountryCH
    Keywords Atomic layer deposition * Nanophotonics * Emissivity * Cryogenics * Spacecraft * Copper
    Cooperating institutions Aalto University (Finland)
    Picosun Oy (Finland)
    URLhttps://www.sciencedirect.com/science/article/pii/S0040609022000992
    Permanent Linkhttps://hdl.handle.net/11104/0333406
     
Number of the records: 1  

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