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Low-emittance copper-coating system using atomic-layer-deposited aluminum oxide

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    SYSNO ASEP0557634
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleLow-emittance copper-coating system using atomic-layer-deposited aluminum oxide
    Author(s) Nyman, L. (FI)
    Frolec, Jiří (UPT-D) RID, ORCID, SAI
    Pudas, M. (FI)
    Králík, Tomáš (UPT-D) RID, ORCID, SAI
    Musilová, Věra (UPT-D) RID, SAI, ORCID
    Kallio, E. (FI)
    Number of authors6
    Article number139179
    Source TitleThin Solid Films. - : Elsevier - ISSN 0040-6090
    Roč. 749, 1 May (2022)
    Number of pages9 s.
    Publication formPrint - P
    Languageeng - English
    CountryCH - Switzerland
    KeywordsAtomic layer deposition ; Nanophotonics ; Emissivity ; Cryogenics ; Spacecraft ; Copper
    Subject RIVBJ - Thermodynamics
    OECD categoryThermodynamics
    R&D ProjectsLO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingOpen access
    Institutional supportUPT-D - RVO:68081731
    UT WOS000791327600003
    EID SCOPUS85127030076
    DOI10.1016/j.tsf.2022.139179
    AnnotationCopper, due to its unique properties, has a huge technological importance to our society. However, the oxidation of copper remains an issue in numerous application areas. This is especially the case in visible and IR-band optics, where even minuscule oxide layers degrade the thermo-optical properties of copper surfaces. A solution possibly resides in the application of protective coatings, which can simultaneously impair the low thermal emittance of bare copper surfaces. The present paper examines the use of thin Al2O3 layers as a protective coating for copper. Al2O3 layers with thickness of 4.5, 9.1, 18.5 or 28.3 nm were deposited on polished copper discs using atomic layer deposition (ALD). The total hemispherical emissivity and absorptivity of these coated copper discs were measured from 20 K up to room temperature. The emissivity and absorptivity of the copper with ALD-deposited Al2O3 layers increased with rising temperature and layer thickness. Nonetheless, the observed values stayed below 1.8%, allowing the use of the coated copper in systems where low emission or absorption of thermal radiation is needed. Alongside the experiments, we present a computer-based analysis and interpretation, which may be generally applied for prediction of temperature-dependent emittance of metallic surfaces coated with a thin polar dielectric layer.
    WorkplaceInstitute of Scientific Instruments
    ContactMartina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
    Year of Publishing2023
    Electronic addresshttps://www.sciencedirect.com/science/article/pii/S0040609022000992
Number of the records: 1  

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