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Radiation-induced defect accumulation and annealing in Si-implanted gallium oxide

  1. 1.
    KJELDBY, S. B., AZAROV, A., NGUYEN, P. D., VENKATACHALAPATHY, V., MIKŠOVÁ, R., MACKOVÁ, A., KUZNETSOV, A., PRYTZ, O., VINES, L. Radiation-induced defect accumulation and annealing in Si-implanted gallium oxide. Journal of Applied Physics. 2022, 131(12), 125701. ISSN 0021-8979. E-ISSN 1089-7550. Available: doi: 10.1063/5.0083858.
Number of the records: 1  

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