Number of the records: 1
Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
- 1.0541687 - FZÚ 2022 RIV CH eng J - Journal Article
Hippler, Rainer - Čada, Martin - Kšírová, Petra - Olejníček, Jiří - Jiříček, Petr - Houdková, Jana - Wulff, H. - Kruth, A. - Helm, C.A. - Hubička, Zdeněk
Deposition of cobalt oxide films by reactive pulsed magnetron sputtering.
Surface and Coatings Technology. Roč. 405, Jan (2021), č. článku 126590. ISSN 0257-8972
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA MPO FV20580; GA ČR GA19-00579S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) StrategieAV21/6
Program: StrategieAV
Institutional support: RVO:68378271
Keywords : cobalt oxide film * pulsed magnetron sputtering * HiPIMS * Raman spectroscopy * XPS * XRD * electrical resistivity
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4.865, year: 2021
Method of publishing: Limited access
https://doi.org/10.1016/j.surfcoat.2020.126590
Permanent Link: http://hdl.handle.net/11104/0319218
Number of the records: 1