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Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
- 1.Hippler, R., Čada, M., Kšírová, P., Olejníček, J., Jiříček, P., Houdková, J., Wulff, H., Kruth, A., Helm, C.A., Hubička, Z. Deposition of cobalt oxide films by reactive pulsed magnetron sputtering. Surface and Coatings Technology. 2021, 405(Jan), 126590. ISSN 0257-8972. Available: doi: 10.1016/j.surfcoat.2020.126590.
Number of the records: 1