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Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
- 1.HIPPLER, R., ČADA, M., KŠÍROVÁ, P., OLEJNÍČEK, J., JIŘÍČEK, P., HOUDKOVÁ, J., WULFF, H., KRUTH, A., HELM, C.A., HUBIČKA, Z. Deposition of cobalt oxide films by reactive pulsed magnetron sputtering. Surface and Coatings Technology. 2021, 405(Jan), 126590. ISSN 0257-8972. Available: doi: 10.1016/j.surfcoat.2020.126590.
Number of the records: 1