Number of the records: 1
Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
- 1.Hippler, Rainer - Čada, Martin - Kšírová, Petra - Olejníček, Jiří - Jiříček, Petr - Houdková, Jana - Wulff, H. - Kruth, A. - Helm, C.A. - Hubička, Zdeněk
Deposition of cobalt oxide films by reactive pulsed magnetron sputtering.
Surface and Coatings Technology. Roč. 405, Jan (2021), č. článku 126590. ISSN 0257-8972
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4.865, year: 2021
Method of publishing: Limited access
https://doi.org/10.1016/j.surfcoat.2020.126590
http://hdl.handle.net/11104/0319218
Number of the records: 1